2024年8月30日、NIMSにて、清水徹英 准教授（東京都立大学）によるご講演が第161回構材ゼミとして開催されました。
共に来訪された Caroline Hain Postdoctoral Researcher (Empa)も最新の研究内容を講演されました。
講演後の集合写真
清水徹英 准教授（左から2人目）
Caroline Hain Postdoctoral Researcher（中央）
High Power Impulse Magnetron Sputtering (HiPIMS) has been focused on as a next-generation Ionization Physical Vapor Deposition (I-PVD) technology. It has been actively studied since early 2000s, and in recent years the uniqueness of this technolgy is again attracting attention as a new manufacturing process in line with the recent growth of the semiconductor industry. In this presentation, the characteristics of HiPIMS technology will be briefly introduced, and its uniqueness among the other I-PVD process will be reviewed from the viewpoint of flexibility of process control based on the transient phenomena of HiPIMS plasma.
Biography:
Tetsuhide Shimizu is an associate professor of Faculty of Systems Design, Tokyo Metropolitan University, Tokyo, Japan since April 2020. He is also a visiting scientist at Department of Physics, Chemistry and Biology, Linköping University in Sweden since 2015. His main field of interest is surface engineering of transition metal nitride and oxide coatings, focusing on low temperature growth by high power impulse magnetron sputtering (HiPIMS). In particular, HiPIMS process design based on the understanding of time-transient plasma physics using several plasma diagnostics tools, e.g., time resolved OES and mass-spectrometry studies are in focus. Recently the process development is further extended also for synthesis of metal nano-particles by using hollow cathode sputtering.